EUV pod introduction

Huaping Wang; Russ Raschke; Phil Glynn

doi:10.1117/12.2678328

12 December 2023 EUV pod introduction

Huaping Wang, Russ Raschke, Phil Glynn

Proceedings Volume PC12751, Photomask Technology 2023; PC127510J (2023) https://doi.org/10.1117/12.2678328
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

EUV pods are used to transport, store and protect EUV masks in the photo lithography processes of advanced semiconductor fabs. The EUV pod has two main functions, 1) protecting EUV masks from contamination and physical damage, 2) providing interface with automation to ensure reliable sensing and pick-and-place. This paper provides an overview of the requirements of the EUV pod, as well as how to achieve the above two main functions in design, and how to ensure the EUV pod continues to perform these two functions well in use. On the design, we will be discussion the dual pod architecture, material choice considerations, dimensions, and weight. On the preventive maintenance, we will cover pod cleaning and inspection. Comparison between a pellicle-capable EUV pod and a non-pellicle capable EUV pod will also be discussed.

Conference Presentation

Citation Download Citation

Huaping Wang, Russ Raschke, and Phil Glynn "EUV pod introduction", Proc. SPIE PC12751, Photomask Technology 2023, PC127510J (12 December 2023); https://doi.org/10.1117/12.2678328

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