Polypeptoid brushes as growth-promoters in vapor phase infiltration for area-selective deposition of aluminum oxide hard masks

Beihang Yu; Maggy Harake; Yujin Lee; Stacey F. Bent; Ricardo Ruiz

doi:10.1117/12.3011335

10 April 2024 Polypeptoid brushes as growth-promoters in vapor phase infiltration for area-selective deposition of aluminum oxide hard masks

Beihang Yu, Maggy Harake, Yujin Lee, Stacey F. Bent, Ricardo Ruiz

Author Affiliations +

Proceedings Volume PC12956, Novel Patterning Technologies 2024; PC129560S (2024) https://doi.org/10.1117/12.3011335
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

Bottom-up nanofabrication with area-selective deposition provides a viable way to minimize edge placement error in semiconductor manufacturing. Here we developed a class of polymers, polypeptoids, as growth promoters that enhance nucleation and growth of metal oxides in vapor phase infiltration for area-selective deposition, generating aluminum oxide hard masks for pattern transfer with high selectivity. This material platform, with its capability to efficiently promote metal oxide growth and versatility in monomer-level chemical functionality control, will enable new area-selective deposition and pattern transfer methods.

Conference Presentation

Citation Download Citation

Beihang Yu, Maggy Harake, Yujin Lee, Stacey F. Bent, and Ricardo Ruiz "Polypeptoid brushes as growth-promoters in vapor phase infiltration for area-selective deposition of aluminum oxide hard masks", Proc. SPIE PC12956, Novel Patterning Technologies 2024, PC129560S (10 April 2024); https://doi.org/10.1117/12.3011335

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