Solid State Electron Beam Chemistry

J. Pacansky

doi:10.1117/12.935089

7 November 1983 Solid State Electron Beam Chemistry

J. Pacansky

Proceedings Volume 0393, Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II; (1983) https://doi.org/10.1117/12.935089
Event: 1983 Microlithography Conferences, 1983, Santa Clara, United States

Abstract

A brief account is presented on an approach for a quantitative understanding of solid state electron beam chemistry that is directed towards understanding the radiation sensitivity of electron beam resists. Results obtained by irradiating PVA with and without additives, using a 25 kV electron beam, are shown in order to investigate the possible spherical and chemical mechanisms induced by the electron beam.

Citation Download Citation

J. Pacansky "Solid State Electron Beam Chemistry", Proc. SPIE 0393, Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II, (7 November 1983); https://doi.org/10.1117/12.935089

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