Wafer-Scale Laser Pantography: VI. Direct-Write Interconnection Of VLSI Gate Arrays

Bruce M McWilliams; Hon Wah Chin; Irving P Herman; Roderick A. Hyde; Fred Mitlitsky; John C. Whitehead; Lowell L. Wood

doi:10.1117/12.939434

14 June 1984 Wafer-Scale Laser Pantography: VI. Direct-Write Interconnection Of VLSI Gate Arrays

Bruce M McWilliams, Hon Wah Chin, Irving P Herman, Roderick A. Hyde, Fred Mitlitsky, John C. Whitehead, Lowell L. Wood

Proceedings Volume 0459, Laser-Assisted Deposition, Etching, and Doping; (1984) https://doi.org/10.1117/12.939434
Event: 1984 Los Angeles Technical Symposium, 1984, Los Angeles, United States

Abstract

General principles of laser direct-write deposition processes are reviewed. Device interconnection of CMOS gate arrays by means of computer-controlled, laser-induced thermochemical surface reactions is described. Interconnection quality parameters are related, and processing rate considerations are discussed.

Citation Download Citation

Bruce M McWilliams, Hon Wah Chin, Irving P Herman, Roderick A. Hyde, Fred Mitlitsky, John C. Whitehead, and Lowell L. Wood "Wafer-Scale Laser Pantography: VI. Direct-Write Interconnection Of VLSI Gate Arrays", Proc. SPIE 0459, Laser-Assisted Deposition, Etching, and Doping, (14 June 1984); https://doi.org/10.1117/12.939434

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