Extending The Limits Of Pattern Inspection Using Machine Vision

Michael L. Baird; Raul Brauner; H. K. Hu; Terry K. Herms

doi:10.1117/12.947757

23 July 1985 Extending The Limits Of Pattern Inspection Using Machine Vision

Michael L. Baird, Raul Brauner, H. K. Hu, Terry K. Herms

Proceedings Volume 0538, Optical Microlithography IV; (1985) https://doi.org/10.1117/12.947757
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

Current state-of-the-art instruments for automatic visual inspection of masks, reticles, or wafers, are targeted to inspect patterns with line widths as small as 1.5 micron (gm) and defects as small as 0.5 micron. New near term targets for production inspection machines will require inspection of 1.0 micron line width patterns and 0.3 micron defects. The types of inspection machines which will adequately address these new targets will require very robust image analysis algorithms. Some current instrumentation will predictably fail in the sub-0.3 micron to sub-0.5 micron defect size range due to fundamental limitations of traditional image acquisition and processing methods (e.g., pixel to pixel comparison modes). Two studies were carried out to see how defect detection might be improved using a new approach exploiting adaptive signal processing, artificial intelligence methodologies, and CAD directed model matching. The first study investigated the current practice/ limits of defect detection; measuring the reliability with which defects could be detected, measured, and correlated with a CAD data base. We conclude that defects greater or equal to 0.5 micron can be consistently detected at a high (>90Z confidence level); with defects as small as 0.3 - 0.4 micron being detected routinely. In the second study, we explored the realistic potential of defect detectability of the new approach. In this experiment we report very encouraging experimental data extending to line widths of 0.5 micron, and defects below 0.2 micron.

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Michael L. Baird, Raul Brauner, H. K. Hu, and Terry K. Herms "Extending The Limits Of Pattern Inspection Using Machine Vision", Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); https://doi.org/10.1117/12.947757

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