Linewidth Control In Optical Projection Printing: Influence Of Resist Parameters

Wolfgang Arden; Leonhard Mader

doi:10.1117/12.947836

18 April 1985 Linewidth Control In Optical Projection Printing: Influence Of Resist Parameters

Wolfgang Arden, Leonhard Mader

Proceedings Volume 0539, Advances in Resist Technology and Processing II; (1985) https://doi.org/10.1117/12.947836
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

Photoresist linewidth profiles for optical projection printing with high performance stepper lenses were simulated using the SAMPLE program. Profile slopes and linewidth variations of resist structures on profiled surfaces (silicon and aluminum substrates) have been investigated in dependance on photoresist parameters such as optical absorption coefficient and thickness of the photoresist as well as exposure/development time. The study also discusses the influence of exposure wavelength (g-line vs. h-line vs. i-line) on line edge slope and standing wave effects.

Citation Download Citation

Wolfgang Arden and Leonhard Mader "Linewidth Control In Optical Projection Printing: Influence Of Resist Parameters", Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); https://doi.org/10.1117/12.947836

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available