Laser Created X-Ray Sources For Microlithography

M. Chaker; H. Pepin; V. Bareau; S. Boily; B. Lafontaine; R. Fabbro; I. Toubhans; B. Faral; J. F. Currie; D. Nagel; M. Peckerar

doi:10.1117/12.964892

1 January 1986 Laser Created X-Ray Sources For Microlithography

M. Chaker, H. Pepin, V. Bareau, S. Boily, B. Lafontaine, R. Fabbro, I. Toubhans, B. Faral, J. F. Currie, D. Nagel, M. Peckerar

Author Affiliations +

Proceedings Volume 0733, Soft X-Ray Optics and Technology; (1986) https://doi.org/10.1117/12.964892
Event: Soft X-Ray Optics and Technology, 1987, Berlin, Germany

Abstract

Laser created X-ray sources have been investigated both theoretically and experimentally using λ = 1.06 μm and λ = 0.26 μm and short pulses (0.5 nsec). Some preliminary results are given with UV radiation obtained with a long pulse (25 nsec) excimer laser. The con-version efficiency of the X-ray emission in the sub-keV (0.1-0.75 keV) and keV (0.75-2 keV) ranges is given for various atomic numbers and a large range of laser intensities. Using these results and resist sensitivities, we discuss the characteristics of the laser required for X-ray lithography.

Citation Download Citation

M. Chaker, H. Pepin, V. Bareau, S. Boily, B. Lafontaine, R. Fabbro, I. Toubhans, B. Faral, J. F. Currie, D. Nagel, and M. Peckerar "Laser Created X-Ray Sources For Microlithography", Proc. SPIE 0733, Soft X-Ray Optics and Technology, (1 January 1986); https://doi.org/10.1117/12.964892

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