Multilayer coating of optical substrates by ion beam sputtering

M. V. Daniel; M. Demmler

doi:10.1117/12.2279788

16 October 2017 Multilayer coating of optical substrates by ion beam sputtering

M. V. Daniel, M. Demmler

Proceedings Volume 10448, Optifab 2017; 104481V (2017) https://doi.org/10.1117/12.2279788
Event: SPIE Optifab, 2017, Rochester, New York, United States

Abstract

Ion beam sputtering is well established in research and industry, despite its relatively low deposition rates compared to electron beam evaporation. Typical applications are coatings of precision optics, like filters, mirrors and beam splitter. Anti-reflective or high-reflective multilayer stacks benefit from the high mobility of the sputtered particles on the substrate surface and the good mechanical characteristics of the layers. This work gives the basic route from single layer optimization of reactive ion beam sputtered Ta2O5 and SiO2 thin films towards complex multilayer stacks for high-reflective mirrors and anti-reflective coatings. Therefore films were deposited using different oxygen flow into the deposition chamber Afterwards, mechanical (density, stress, surface morphology, crystalline phases) and optical properties (reflectivity, absorption and refractive index) were characterized. These knowledge was used to deposit a multilayer coating for a high reflective mirror.

Citation Download Citation

M. V. Daniel and M. Demmler "Multilayer coating of optical substrates by ion beam sputtering", Proc. SPIE 10448, Optifab 2017, 104481V (16 October 2017); https://doi.org/10.1117/12.2279788

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