General Approaches To Mask Design For Binary Optics

James Logue; Marilynn L. Chisholm

doi:10.1117/12.951482

6 May 1989 General Approaches To Mask Design For Binary Optics

James Logue, Marilynn L. Chisholm

Proceedings Volume 1052, Holographic Optics: Optically and Computer Generated; (1989) https://doi.org/10.1117/12.951482
Event: OE/LASE '89, 1989, Los Angeles, CA, United States

Abstract

The fabrication of binary optics using high quality lithographic processes requires binary masks with constant phase contours. Parameter driven software for the development of these masks has been developed at Perkin-Elmer. Applications include zone plates, aspheric lenses, and optics described using Zernike polynomials, arbitrary phase functions, and sampled phase arrays.

Citation Download Citation

James Logue and Marilynn L. Chisholm "General Approaches To Mask Design For Binary Optics", Proc. SPIE 1052, Holographic Optics: Optically and Computer Generated, (6 May 1989); https://doi.org/10.1117/12.951482

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