Benchmarking 3-color photoresists for multiphoton absorption lithography

Nikolaos Liaros; Sandra A. Gutierrez Razo; Zuleykhan Tomova; John S. Petersen; John T. Fourkas

doi:10.1117/12.2299318

19 March 2018 Benchmarking 3-color photoresists for multiphoton absorption lithography

Nikolaos Liaros, Sandra A. Gutierrez Razo, Zuleykhan Tomova, John S. Petersen, John T. Fourkas

Proceedings Volume 10584, Novel Patterning Technologies 2018; 1058417 (2018) https://doi.org/10.1117/12.2299318
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

The demand to create ever finer features at ever tighter pitches has fueled the drive towards lithographic methods that use radiation with the shortest possible wavelength. This approach, however, faces a considerable number of technological challenges that need to be addressed. An alternative, cost-effective approach is multicolor lithography. Inspired by the technology for superresolution in optical microscopy, multicolor visible light approaches led to achieving features down to λ/20 using 3-D multiphoton absorption polymerization (MAP). Although these original efforts in the field involved the use of two colors of light, it has become apparent that 3-color approaches will be required to address the need to pack features together tightly. In this work, we present some of the latest progress in the benchmarking and development of three-color photoresist materials, and demonstrate how the addition of a third color in the exposure scheme can lead to substantial improvements in resolution.

Citation Download Citation

Nikolaos Liaros, Sandra A. Gutierrez Razo, Zuleykhan Tomova, John S. Petersen, and John T. Fourkas "Benchmarking 3-color photoresists for multiphoton absorption lithography", Proc. SPIE 10584, Novel Patterning Technologies 2018, 1058417 (19 March 2018); https://doi.org/10.1117/12.2299318

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