Measurement Of H And H[sub]2[/sub] Populations In-Situ In A Low-Temperature Plasma By Vacuum-Ultraviolet Laser-Absorption Spectroscopy

A. S. Schlachter; A. T. Young; G. C. Stutzin; J. W. Stearns; H. F. Dobele; K. N. Leung; W. B. Kunkel

doi:10.1117/12.951848

25 July 1989 Measurement Of H And H₂ Populations In-Situ In A Low-Temperature Plasma By Vacuum-Ultraviolet Laser-Absorption Spectroscopy

A. S. Schlachter, A. T. Young, G. C. Stutzin, J. W. Stearns, H. F. Dobele, K. N. Leung, W. B. Kunkel

Author Affiliations +

Proceedings Volume 1061, Microwave and Particle Beam Sources and Directed Energy Concepts; (1989) https://doi.org/10.1117/12.951848
Event: OE/LASE '89, 1989, Los Angeles, CA, United States

Abstract

A new technique, vacuum-ultraviolet laser-absorption spectroscopy, has been developed to quantitatively determine the absolute density of H and H2 within a plasma. The technique is particularly well suited to measurement in a plasma, where high charged particle and photon backgrounds complicate other methods of detection. The high selectivity and sensitivity of the technique allows for the measurement of the rotational-vibrational state distribution of H2 as well as the translational temperature of the atoms and molecules. The technique has been used to study both pulsed and continuous IC ion-source plasma discharges. H2 state distributions in a multicusp "volume" If ion-source plasma show a high degree of internal excitation, with levels up to v = 5 and J = 8 being observed. The method is applicable for a very wide range of plasma conditions. Emission measurements from excited states of H are also reported.

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A. S. Schlachter, A. T. Young, G. C. Stutzin, J. W. Stearns, H. F. Dobele, K. N. Leung, and W. B. Kunkel "Measurement Of H And H₂ Populations In-Situ In A Low-Temperature Plasma By Vacuum-Ultraviolet Laser-Absorption Spectroscopy", Proc. SPIE 1061, Microwave and Particle Beam Sources and Directed Energy Concepts, (25 July 1989); https://doi.org/10.1117/12.951848

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