Oxygen plasma etching of YAG crystals

Giedrius Abromavičius; Naglis Kyžas; Alexandr Belosludtsev

doi:10.1117/12.2314456

7 June 2018 Oxygen plasma etching of YAG crystals

Giedrius Abromavičius, Naglis Kyžas, Alexandr Belosludtsev

Proceedings Volume 10691, Advances in Optical Thin Films VI; 1069123 (2018) https://doi.org/10.1117/12.2314456
Event: SPIE Optical Systems Design, 2018, Frankfurt, Germany

Abstract

High surface quality of the optical elements is one of the key factors enabling their effective application in high power laser systems. In our work, commercially polished undoped YAG crystals were etched using low energy oxygen plasma. Surface roughness and optical properties were investigated using two different etching depths. Obtained results demonstrate smoothing of initial crystal surface and 1-4 % decrease of transmittance within UV-VIS spectral range.

Citation Download Citation

Giedrius Abromavičius, Naglis Kyžas, and Alexandr Belosludtsev "Oxygen plasma etching of YAG crystals", Proc. SPIE 10691, Advances in Optical Thin Films VI, 1069123 (7 June 2018); https://doi.org/10.1117/12.2314456

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available