Presentation + Paper
4 March 2019 Influence of numerical aperture (NA) on micro-reflectance spectroscopy
Xinhua Pan, Nassim Rahimi, Alain Price, Askari Ghasempour, Francis C. Ndi
Author Affiliations +
Proceedings Volume 10925, Photonic Instrumentation Engineering VI; 109250S (2019) https://doi.org/10.1117/12.2510619
Event: SPIE OPTO, 2019, San Francisco, California, United States
Abstract
Micro-reflectance (μ-R) spectroscopy is a powerful technique for investigating the micro-scaled surfaces and interfaces, such as semiconductors, metals, etc. We discuss and compare the μ-R spectroscopy on specular (Si wafer) and scattering (MoS2 flake) surfaces using various objectives with different NA. μ-R is calculated by the ratio of sample to reference spectra, it follows the sequence of NA on scattering surface, which is proven by larger NA showing better performance for scattered irradiance due to its wider collection angle. Micro-reflectance difference (μ-RD) of each wavelength is further calculated, and it’s 30 times larger on scattering MoS2 flake surface than specular Si wafer surface.
Conference Presentation
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xinhua Pan, Nassim Rahimi, Alain Price, Askari Ghasempour, and Francis C. Ndi "Influence of numerical aperture (NA) on micro-reflectance spectroscopy", Proc. SPIE 10925, Photonic Instrumentation Engineering VI, 109250S (4 March 2019); https://doi.org/10.1117/12.2510619
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KEYWORDS
Reflectivity

Objectives

Silicon

Semiconducting wafers

Spectroscopy

Scattering

Molybdenum

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