CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 10960 > Article
Open Access Presentation
25 March 2019 Metal-containing resists for EUV lithography (Conference Presentation)
Robert L. Brainard
Author Affiliations +
Proceedings Volume 10960, Advances in Patterning Materials and Processes XXXVI; 1096002 (2019) https://doi.org/10.1117/12.2516012
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States
Abstract
Metal-Containing Resists for EUV Lithography Robert L. Brainard State University of New York Polytechnic Institute - CNSE, 257 Fuller Rd. Albany, NY 12203 Since 2009, the photoresist community has shown a great deal of interest in EUV photoresists containing metallic elements. This interest was initiated by two events: (1) Publication of the pioneering work of OSU1 and Cornell;2 (2) The realization that increasing the EUV optical density of resists will improve stochastics.3 Since these two events, photoresist chemists all over the world have begun investigating the possibility of creating photoresists containing metals that strongly absorb EUV photons. Figure 1 shows the periodic table that is color-coded to indicate the relative EUV optical density of the elements.4 This table also shows all of the elements for which EUV resists have been published. This keynote presentation will attempt to review the most successful EUV resist platforms containing metals. In particular, the work of Inpria,5 Cornell, SUNY Poly6 and ARCNL7 will be described and discussed. The presentation will also describe some of the critical issues facing the industry as it evaluates the merits and challenges of using resists containing metals.
Conference Presentation
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Robert L. Brainard "Metal-containing resists for EUV lithography (Conference Presentation)", Proc. SPIE 10960, Advances in Patterning Materials and Processes XXXVI, 1096002 (25 March 2019); https://doi.org/10.1117/12.2516012
PROCEEDINGS
 PRESENTATION
WATCH
PRESENTATION SAVE TO MY LIBRARY
GET CITATION
Advertisement
Advertisement
KEYWORDS
Extreme ultraviolet lithography
Photoresist materials
Extreme ultraviolet
Metals
Absorbance
Chemical elements
Optical components
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top