Paper
26 February 2020 Fundamental limitations of ultra-flat resonant dielectric metasurfaces
Author Affiliations +
Proceedings Volume 11290, High Contrast Metastructures IX; 112900U (2020) https://doi.org/10.1117/12.2550172
Event: SPIE OPTO, 2020, San Francisco, California, United States
Abstract
There are two physical effects that are exploited nowadays to implement flat metalenses requiring 2𝜋-phase excursion, either subwavelength guidance implementing varying propagation delays, or resonant confinement combining two resonances. We compare both approaches and identify possible limitations with the second approach.
© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Carlo Gigli, Pierre Chavel, and Philippe Lalanne "Fundamental limitations of ultra-flat resonant dielectric metasurfaces", Proc. SPIE 11290, High Contrast Metastructures IX, 112900U (26 February 2020); https://doi.org/10.1117/12.2550172
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KEYWORDS
Chemical species

Dielectrics

Silicon

Waveguides

Diffractive optical elements

Nanostructures

Particles

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