Critical-dimension grazing-incidence small angle X-Ray scattering: applications and development (Conference Presentation)

Guillaume Freychet; Dinesh Kumar; Isvar A. Cordova; Ron J. Pandolfi; Patrick P. Naulleau; Cheng Wang; Alex Hexemer

doi:10.1117/12.2552155

24 March 2020 Critical-dimension grazing-incidence small angle X-Ray scattering: applications and development (Conference Presentation)

Guillaume Freychet, Dinesh Kumar, Isvar A. Cordova, Ron J. Pandolfi, Patrick P. Naulleau, Cheng Wang, Alex Hexemer

Author Affiliations +

Proceedings Volume 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV; 113251A (2020) https://doi.org/10.1117/12.2552155
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

As the lithographically manufactured nanostructures are shrinking in size, conventional techniques, such as microscopies (SEM, AFM) reach their resolution limits. We have developed a high-performance Grazing Incidence SAXS simulation tool to reconstruct the in-depth profile highly ordered material such as line gratings [1, 2]. Here, we will present the latest development and applications of the technique using x-rays to characterize line gratings and contact holes. Specifically, we will show how the CD-GISAXS approach has been extended to extract the in-depth profile dispersion of the lines, leading to a quantification of the line edge roughness. Finally, by introducing a recent study which harnessed the chemical sensitivity provided by soft x-ray scattering to extract latent image profiles from resists [3], we highlight new applications for this technique with high potential.

Conference Presentation

Citation Download Citation

Guillaume Freychet, Dinesh Kumar, Isvar A. Cordova, Ron J. Pandolfi, Patrick P. Naulleau, Cheng Wang, and Alex Hexemer "Critical-dimension grazing-incidence small angle X-Ray scattering: applications and development (Conference Presentation)", Proc. SPIE 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV, 113251A (24 March 2020); https://doi.org/10.1117/12.2552155

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