Optical and stress properties of flexible Nb2O5/SiO2 multi layer films deposited by E-gun evaporation with ion-beam assisted deposition

Sheng-Bin Chen; Hsi-Chao Chen; Chun-Hao Chang; Yu-Ru Lu; Wei-Lin Chen

doi:10.1117/12.2574756

15 June 2020 Optical and stress properties of flexible Nb₂O₅/SiO₂ multi layer films deposited by E-gun evaporation with ion-beam assisted deposition

Sheng-Bin Chen, Hsi-Chao Chen, Chun-Hao Chang, Yu-Ru Lu, Wei-Lin Chen

Author Affiliations +

Proceedings Volume 11523, Optical Technology and Measurement for Industrial Applications 2020; 1152307 (2020) https://doi.org/10.1117/12.2574756
Event: SPIE Technologies and Applications of Structured Light, 2020, Yokohama, Japan

Abstract

The high & low refractive index (Nb₂O₅/SiO₂)² multi-layer films were deposited by E-gun evaporation with ion-beam assisted deposition (IAD) on flexible PET substrate. The optical property and anisotropic residual stress were investigated. The residual stress of each layer film was measured step by step with self-made shadow moiré interferometer. The experimental results showed the optimal oxygen flow of Nb₂O₅ and SiO₂ were 20 and 25 sccm, respectively, for the absorption coefficient less than 10^-3. The principle stresses were changed from tensor to compressor stress from 6,665 to - 916MPa for one layer to (HL)² four layers. The shearing stresses were all tensor stresses from 5,876 to 406 MPa for one layer to (HL)² four layers. The multi-layer films real reduced the residual stress.

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Sheng-Bin Chen, Hsi-Chao Chen, Chun-Hao Chang, Yu-Ru Lu, and Wei-Lin Chen "Optical and stress properties of flexible Nb₂O₅/SiO₂ multi layer films deposited by E-gun evaporation with ion-beam assisted deposition", Proc. SPIE 11523, Optical Technology and Measurement for Industrial Applications 2020, 1152307 (15 June 2020); https://doi.org/10.1117/12.2574756

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