PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
We propose and prove an alternative view of patterns on the EUV mask absorber as waveguides. The geometrical similarities between waveguides and EUV mask after stripping out the multilayer is shown. The waveguiding effect inside the EUV mask absorber is demonstrated by comparing rigorous RCWA (rigorous coupled-wave analysis) to the waveguide analytical solution. Our investigations of the near field of EUV mask demonstrate that waveguide effects dominate transmission of light through openings in the absorber of EUV masks.
This perspective of the EUV mask is not to provide a model that explains all phenomena in EUV imaging scenarios or to propose other absorber materials. Instead, the proposed waveguide perspective of EUV masks helps to understand the root causes of certain far field and imaging characteristics of EUV masks.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
The alert did not successfully save. Please try again later.
Hazem Mesilhy, Peter Evanschitzky, Gerardo Bottiglieri, Claire van Lare, Eelco van Setten, Andreas Erdmann, "Investigation of waveguide modes in EUV mask absorbers," Proc. SPIE 11609, Extreme Ultraviolet (EUV) Lithography XII, 116090E (22 February 2021); https://doi.org/10.1117/12.2587948