Deep UV for materials processing based on the industrial TruMicro Series of ultrafast solid-state laser amplifiers

Stephan Häfner; Carolin Wagner; Benyamin Shnirman; Markus Ginter; Jonathan Brons; Marc Sailer; Axel Fehrenbacher; Daniel Grossmann; Daniel Flamm; Kian Janami; Steffen Ruebling; Ulf Quentin; Aleksander Budnicki; Ivo Zawischa; Dirk H. Sutter

doi:10.1117/12.2577162

5 March 2021 Deep UV for materials processing based on the industrial TruMicro Series of ultrafast solid-state laser amplifiers

Stephan Häfner, Carolin Wagner, Benyamin Shnirman, Markus Ginter, Jonathan Brons, Marc Sailer, Axel Fehrenbacher, Daniel Grossmann, Daniel Flamm, Kian Janami, Steffen Ruebling, Ulf Quentin, Aleksander Budnicki, Ivo Zawischa, Dirk H. Sutter

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Proceedings Volume 11670, Nonlinear Frequency Generation and Conversion: Materials and Devices XX; 116701F (2021) https://doi.org/10.1117/12.2577162
Event: SPIE LASE, 2021, Online Only

Abstract

Ultrashort laser pulses in the deep ultraviolet (DUV) based on nonlinear-optical conversion of NIR solid state sources promise advantages for the machining of wide-bandgap materials such as compound semiconductors like indium / aluminum / gallium nitride (InAlGaN, AlN, GaN), silicon carbide (SiC), zinc sulfide (ZnS), or boron nitride (BN). We present systems providing few-picosecond pulses at 257.5 nm with high average power exceeding 20 W of DUV obtained by frequency quadrupling of our proven TruMicro Series of industrial ultrafast amplifiers. High beam quality and decent lifetime of the DUV optics are demonstrated.

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Stephan Häfner, Carolin Wagner, Benyamin Shnirman, Markus Ginter, Jonathan Brons, Marc Sailer, Axel Fehrenbacher, Daniel Grossmann, Daniel Flamm, Kian Janami, Steffen Ruebling, Ulf Quentin, Aleksander Budnicki, Ivo Zawischa, and Dirk H. Sutter "Deep UV for materials processing based on the industrial TruMicro Series of ultrafast solid-state laser amplifiers", Proc. SPIE 11670, Nonlinear Frequency Generation and Conversion: Materials and Devices XX, 116701F (5 March 2021); https://doi.org/10.1117/12.2577162

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KEYWORDS

Deep ultraviolet

Optical amplifiers

Solid state electronics

Ultrafast phenomena

Materials processing

Solid state lasers

Gallium nitride

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