Russell Dent,1 Brittany N. Hoffmanhttps://orcid.org/0000-0003-2028-1973,1 Alexei A. Kozlov,1 Nan Liu,1 Amy L. Rigatti,1 Stavros G. Demos,1 Alexander A. Shesopalov1
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We investigate contamination induced in grating-like structures during the etching process as a possible precursor to laser-induced damage. Our experimental model utilizes 5-mm line structures fabricated in E-beam–deposited coatings of silica using reactive ion etching (RIE) and reactive ion beam etching (RIBE). This makes it possible to compare the behavior in the pillars and trench regions. The results suggest that surface contaminants are primarily fluorinated polymers, while embedded contaminants consist primarily of carbon with very low detection of fluorine. Samples fabricated by the RIBE method exhibit significantly reduced roughness in the trenches, yet still present similar embedded contamination.
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Russell Dent, Brittany N. Hoffman, Alexei A. Kozlov, Nan Liu, Amy L. Rigatti, Stavros G. Demos, Alexander A. Shesopalov, "Embedded contamination induced by etching in E-beam deposited silica: A possible precursor to laser damage," Proc. SPIE 11910, Laser-Induced Damage in Optical Materials 2021, 1191014 (12 October 2021); https://doi.org/10.1117/12.2597975