Poster + Paper
15 September 2022 The application of mask data preparation on KLA DB inspection
Fei-Lin Liu, Po-Hsiang Yang, Liang-Chieh Lin, Po-Sheng Wang
Author Affiliations +
Conference Poster
Abstract
Mask Data Preparation, MDP contains comprehensive contents such as reticle layout, mask fracturing, manufacture rule check, etc. We have demonstrated a MDP application on KLA DB inspection. In order to calculate the rendering compensation, Pre-Swath Calibration, PSC is performed before DB inspection. We have built a rule on PSC point searching function which combines the density function of Smart MRC with algorithm. The result shows that this function could save the PSC selection time and also improvement the fail rate of PSC selection. A well-prepared inspection recipe could be done by automation tool. Therefore, the setup time on DB inspection could be minimized, also could save inspection resource as well.
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Fei-Lin Liu, Po-Hsiang Yang, Liang-Chieh Lin, and Po-Sheng Wang "The application of mask data preparation on KLA DB inspection", Proc. SPIE 12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250U (15 September 2022); https://doi.org/10.1117/12.2640662
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KEYWORDS
Inspection

Calibration

Algorithm development

Manufacturing

Reticles

Data conversion

Diffusion

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