Deposition and characterization of sputtered vanadium dioxide films

Christopher C.H. Hale; James S. Orr; H. Gordon; H. J. Orr; Leonard T. Traub; Keith L. Lewis

doi:10.1117/12.20379

1 August 1990 Deposition and characterization of sputtered vanadium dioxide films

Christopher C.H. Hale, James S. Orr, H. Gordon, H. J. Orr, Leonard T. Traub, Keith L. Lewis

Proceedings Volume 1270, Optical Thin Films and Applications; (1990) https://doi.org/10.1117/12.20379
Event: The International Congress on Optical Science and Engineering, 1990, The Hague, Netherlands

Abstract

Reactive RF planar magnetron sputtering has been used to deposit thin films of vanadium dioxide onto silicon and germanium substrates. The present work demonstrates the feasibility of reliably reproducing stoichiometric material by this method. The films exhibit a sharply defined transition in optical properties. The temperature over which the transition occurs is examined. Attention has been given to determination of the structure of the vanadium dioxide and the relation to the switching properties. X-ray diffraction techniques were employed to assess structural purity. Fine surface texture has been evaluated using a high resolution stylus instrument and some relation to optical scatter loss is made. The optical transmission of an enhanced transmission thermal switching device incorporating a vanadium dioxide film is reported.

Citation Download Citation

Christopher C.H. Hale, James S. Orr, H. Gordon, H. J. Orr, Leonard T. Traub, and Keith L. Lewis "Deposition and characterization of sputtered vanadium dioxide films", Proc. SPIE 1270, Optical Thin Films and Applications, (1 August 1990); https://doi.org/10.1117/12.20379

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