A study on the imaging characteristics of phase shift mask for EUV technology with novel material

Minkyu P.; Mikyung W.; Gyeongwon S.; Yongdae K.; Chulkyu Y.; Jonghwa L.; Cheol S.

doi:10.1117/12.2687346

21 November 2023 A study on the imaging characteristics of phase shift mask for EUV technology with novel material

Minkyu P., Mikyung W., Gyeongwon S., Yongdae K., Chulkyu Y., Jonghwa L., Cheol S.

Proceedings Volume 12751, Photomask Technology 2023; 127511B (2023) https://doi.org/10.1117/12.2687346
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Conference Poster

Abstract

In EUV lithography, resolution enhancement techniques are applied for manufacturing and also studied actively to improve resolution. Among them, PSM is one of the key technique to improve the resolution limit in the conventional lithography. In this study, we investigated the novel EUV absorber material regarding to imaging properties and patterning process. In simulation tool PROLITH, the reflectivity of novel absorber material PSM was about 9%. As a result, this PSM structure shows better normalized image log slope(NILS) and image contrast. In addition, new PSM structure shows better process friendly properties such as etch rate and PSM profile compared to the conventional Rubased PSM that is currently being actively studied.

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Minkyu P., Mikyung W., Gyeongwon S., Yongdae K., Chulkyu Y., Jonghwa L., and Cheol S. "A study on the imaging characteristics of phase shift mask for EUV technology with novel material", Proc. SPIE 12751, Photomask Technology 2023, 127511B (21 November 2023); https://doi.org/10.1117/12.2687346

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