Different requirements of mask cleaning and the various approaches to achieve a "higher level" of cleanliness based on in-depth experience in chrome blank manufacturing are presented. An asynchronous robotic cleaning technique was developed to avoid any mechanical stress, such as brush scrubbing, as well as minimize any thermal shock to the substrates in the process, detailed chemical analysis was conducted to study an alternative method. Process steps will be discussed in comparison to existing alternative technologies The significance of each step will be addressed, because when used subsequently an improvement is evident. Various users' data illustrates the results of achieving ultimate particle size below 0.5/0.7 microns, total absence of organic contaminants, possibility to re-clean masks many times without damage to the chrome layer and a highly favorable cost/performance ratio using this novel approach as the first step in automating the mask making environment.
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