Paper
12 October 2023 An automated approach to the ever increasing demand of mask cleanliness
Hanspeter Reinhardt, Vladimir Stepanek
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Abstract
Different requirements of mask cleaning and the various approaches to achieve a "higher level" of cleanliness based on in-depth experience in chrome blank manufacturing are presented. An asynchronous robotic cleaning technique was developed to avoid any mechanical stress, such as brush scrubbing, as well as minimize any thermal shock to the substrates in the process, detailed chemical analysis was conducted to study an alternative method. Process steps will be discussed in comparison to existing alternative technologies The significance of each step will be addressed, because when used subsequently an improvement is evident. Various users' data illustrates the results of achieving ultimate particle size below 0.5/0.7 microns, total absence of organic contaminants, possibility to re-clean masks many times without damage to the chrome layer and a highly favorable cost/performance ratio using this novel approach as the first step in automating the mask making environment.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hanspeter Reinhardt and Vladimir Stepanek "An automated approach to the ever increasing demand of mask cleanliness", Proc. SPIE 12812, Bay Area Chrome Users Society Symposium 1988, 128120D (12 October 2023); https://doi.org/10.1117/12.3011947
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