Application of pattern matching on single die photomask for AIMS reference image searching

Fei Lin Liu; Yi-Min Lin; Po-Sheng Wang; Liang-Chieh Lin

doi:10.1117/12.2684881

29 September 2023 Application of pattern matching on single die photomask for AIMS reference image searching

Fei Lin Liu, Yi-Min Lin, Po-Sheng Wang, Liang-Chieh Lin

Proceedings Volume 12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology; 129150N (2023) https://doi.org/10.1117/12.2684881
Event: Photomask Japan 2023, 2023, Online Only

Abstract

In the back-end process of mask manufacturing, AIMS™ plays a crucial role to evaluate defect printing and verify the results of repair. Comparing the difference of luminous intensity between defect and reference regions, the influence of defect could be taken into control accurately. Nevertheless, providing reference images for computation would be a tough task while performing on single die photomasks. Hence, we have developed a methodology for reference searching which take advantage of the pattern matching function in Smart-MRC. By setting up criteria with results of pattern matching, identical or extremely similar reference locations would be point out. It is more dependable and efficient than manual operation on the whole mask. With this Mask Data Preparation technique, the workflow of back-end process becomes smoothly, and the quality of photomask can be guarantee.

Citation Download Citation

Fei Lin Liu, Yi-Min Lin, Po-Sheng Wang, and Liang-Chieh Lin "Application of pattern matching on single die photomask for AIMS reference image searching", Proc. SPIE 12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150N (29 September 2023); https://doi.org/10.1117/12.2684881

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