Mark L. Schattenburg,1 Ralf Heilmann,1 Alexander R. Bruccoleri,2 Vittorio Colicci,1 Bethany Levenson,1 George A. Antonellihttps://orcid.org/0000-0002-8536-2750,3 Nicholas Keller3
1MIT Kavli Institute for Astrophysics and Space Research (United States) 2Izentis LLC (United States) 3Onto Innovation Inc. (United States)
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Next-generation space telescopes under development by NASA will require high efficiency and resolving power soft x-ray spectrometers which can provide an order of magnitude increased performance compared to present space instrumentation. For the past decade the MIT Space Nanotechnology Lab has developed new x-ray spectrometer concepts based on so-called critical-angle transmission (CAT) gratings which exploit the principle of efficient x-ray reflection below the critical angle for total external reflection. These devices require challenging high-aspect ratio (HAR) “nano mirror” grating patterns with well controlled bar tilt angle and sub-nm surface smoothness. Gratings are patterned with precision (110) SOI wafers using 193 nm lithography and etched using a Bosch process. In this paper we present the first results of applying Mueller Matrix OCD mapping to our silicon HAR device geometry and compare with small angle x-ray scattering results.
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Mark L. Schattenburg, Ralf Heilmann, Alexander R. Bruccoleri, Vittorio Colicci, Bethany Levenson, George A. Antonelli, Nicholas Keller, "Metrology challenges for fabrication of high aspect ratio, nano scale x-ray diffraction gratings," Proc. SPIE 12955, Metrology, Inspection, and Process Control XXXVIII, 129550Z (10 April 2024); https://doi.org/10.1117/12.3010409