Stitching interferometry is a powerful metrology technique used to measure the surface topography of optical mirrors with high precision and extended field of view. At the National Synchrotron Light Source II (NSLS-II), stitching interferometry with a Fizeau interferometer or a coherence scanning interferometer has been established to measure the surface topography of synchrotron mirrors.
Stitching interferometry allows the inspection of synchrotron mirrors supplied by the optics vendors. Before the mirrors are installed into the synchrotron beamlines, they must be evaluated to ensure that they meet the stringent specifications (sub-nm RMS over the clear aperture). By employing stitching interferometry, surface deviations can be quantified to estimate the performance at a beamline.
By analyzing the surface topography data collected with the stitching interferometry, we can use the surface residual errors with respect to the target shape to feedback to our developed deterministic fabrication method, Ion Beam Figuring (IBF), to further improve the mirror surface quality.
|