Inhomogeneity in layers of dielectric high index materials: a simplified study for an antireflection coating

Salvador Bosch

doi:10.1117/12.22427

1 December 1990 Inhomogeneity in layers of dielectric high index materials: a simplified study for an antireflection coating

Salvador Bosch

Author Affiliations +

Proceedings Volume 1324, Modeling of Optical Thin Films II; (1990) https://doi.org/10.1117/12.22427
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

A simple procedure to evidence inhomogeneity in the refractive index of a single dielectric thin film included in a AR coating is developed. It requires only the use of standard measurement equipment: a spectrophotometer and a three wavelength e 1 lipsometer. The results show a good agreement between different characterization methods: reflectance, ellipsometry and single layer spectrophotometric analysis.

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Salvador Bosch "Inhomogeneity in layers of dielectric high index materials: a simplified study for an antireflection coating", Proc. SPIE 1324, Modeling of Optical Thin Films II, (1 December 1990); https://doi.org/10.1117/12.22427

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