Fabrication and performance at 1.33 nm of a 0.24-um period multilayer grating

H. Berrouane; Chantal G. Khan Malek; Jean-Michel Andre; L. Lesterlin; F. R. Ladan; Jean-Rene Rivoira; Yves Lepetre; Robert J. Barchewitz

doi:10.1117/12.23230

1 February 1991 Fabrication and performance at 1.33 nm of a 0.24-um period multilayer grating

H. Berrouane, Chantal G. Khan Malek, Jean-Michel Andre, L. Lesterlin, F. R. Ladan, Jean-Rene Rivoira, Yves Lepetre, Robert J. Barchewitz

Author Affiliations +

Proceedings Volume 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography; (1991) https://doi.org/10.1117/12.23230
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

We report on the fabrication of a multilayer linear grating, characterization in the soft x-ray region and modeling of its perfonnance. Holographic lithography was used to produce a 0.24 p.m spatial period grating on a triode sputtered Mo/C multilayer mirror. The pattern was transferred into the multilayer mirror by reactive ion etching in an SF6 plasma after an intermediate lift-off step. The position and relative efficiency of the different orders of a grating etched down to the silicon substrate were measured at the Cu Lcz line (1.33 nm). The results were compared to the values calculated within the framework of a scalar kinematic diffraction theory of relief gratings.

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H. Berrouane, Chantal G. Khan Malek, Jean-Michel Andre, L. Lesterlin, F. R. Ladan, Jean-Rene Rivoira, Yves Lepetre, and Robert J. Barchewitz "Fabrication and performance at 1.33 nm of a 0.24-um period multilayer grating", Proc. SPIE 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography, (1 February 1991); https://doi.org/10.1117/12.23230

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