Surface imaging on the basis of phenolic resin: experiments and simulation

Lothar Bauch; Ulrich A. Jagdhold; Helge H. Dreger; Joachim J. Bauer; Wolfgang W. Hoeppner; Hartmut H. Erzgraeber; Georg G. Mehliss

doi:10.1117/12.46399

1 June 1991 Surface imaging on the basis of phenolic resin: experiments and simulation

Lothar Bauch, Ulrich A. Jagdhold, Helge H. Dreger, Joachim J. Bauer, Wolfgang W. Hoeppner, Hartmut H. Erzgraeber, Georg G. Mehliss

Author Affiliations +

Proceedings Volume 1466, Advances in Resist Technology and Processing VIII; (1991) https://doi.org/10.1117/12.46399
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

Process simulation based on a two dimensional diffusion model for the reaction of the hexamethyldisilazan (HMDS) within the resist considering the crosslinks between photo active component (PAC) and resin and the following dry development is outlined. Results of silylation and etching simulation are discussed. Furthermore the influence of the resin composition and the conditions of silylation will be presented for an ORWO-resist.

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Lothar Bauch, Ulrich A. Jagdhold, Helge H. Dreger, Joachim J. Bauer, Wolfgang W. Hoeppner, Hartmut H. Erzgraeber, and Georg G. Mehliss "Surface imaging on the basis of phenolic resin: experiments and simulation", Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); https://doi.org/10.1117/12.46399

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