Performance of low-resistance microchannel-plate stacks

Oswald H. W. Siegmund; Joseph M. Stock

doi:10.1117/12.48329

1 October 1991 Performance of low-resistance microchannel-plate stacks

Oswald H. W. Siegmund, Joseph M. Stock

Proceedings Volume 1549, EUV, X-Ray, and Gamma-Ray Instrumentation for Astronomy II; (1991) https://doi.org/10.1117/12.48329
Event: San Diego, '91, 1991, San Diego, CA, United States

Abstract

Results are presented from an evaluation of three sets of low resistance microchannel plate (MCP) stacks; the tests encompassed gain, pulse-height distribution, background rate, event rate capacity as a function of illuminated area, and performance changes due to high temperature bakeout and high flux UV scrub. The MCPs are found to heat up, requiring from minutes to hours to reach stabilization. The event rate is strongly dependent on the size of the area being illuminated, with larger areas experiencing a gain drop onset at lower rates than smaller areas.

Citation Download Citation

Oswald H. W. Siegmund and Joseph M. Stock "Performance of low-resistance microchannel-plate stacks", Proc. SPIE 1549, EUV, X-Ray, and Gamma-Ray Instrumentation for Astronomy II, (1 October 1991); https://doi.org/10.1117/12.48329

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