KrF excimer laser etching of diamondlike carbon films

Taras V. Kononenko; Vitali I. Konov; Victor G. Ralchenko; V. E. Strelnitsky

doi:10.1117/12.130765

20 November 1992 KrF excimer laser etching of diamondlike carbon films

Taras V. Kononenko, Vitali I. Konov, Victor G. Ralchenko, V. E. Strelnitsky

Proceedings Volume 1759, Diamond Optics V; (1992) https://doi.org/10.1117/12.130765
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

Diamond-like carbon films with mass density, ranging from 1.7 g/cm³ to 2.4 g/cm³, deposited onto Si in RF glow discharge plasma in benzene were characterized by various techniques in order to obtain a correlation between mechanical, electrical, optical, and thermal properties of the films. Microhardness and optical absorption increase, while electrical resistivity and thermal diffusivity decrease with film density. Etching of DLC films by UV pulses of KrF excimer laser radiation in air was studied. The etch rate was found to decrease with film density. Two etch mechanisms have been identified: (1) carbon oxidation, which provides etch rates V < 5 nm/pulse, and (2) ablation dominating at high fluences (E > 500 mJ/cm²) with V exceeding 100 nm/pulse. Micron-sized patterns in carbon films fabricated by laser etching technique are demonstrated.

Citation Download Citation

Taras V. Kononenko, Vitali I. Konov, Victor G. Ralchenko, and V. E. Strelnitsky "KrF excimer laser etching of diamondlike carbon films", Proc. SPIE 1759, Diamond Optics V, (20 November 1992); https://doi.org/10.1117/12.130765

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