Forming of 'contact window' submicron topological structure by laser vacuum lithography

Anatoly I. Sharendo; Victor V. Boksha; Eduard I. Tochitsky; Vyjacheslav E. Obukhov

doi:10.1117/12.142082

16 March 1993 Forming of "contact window" submicron topological structure by laser vacuum lithography

Anatoly I. Sharendo, Victor V. Boksha, Eduard I. Tochitsky, Vyjacheslav E. Obukhov

Proceedings Volume 1804, Rapid Thermal and Laser Processing; (1993) https://doi.org/10.1117/12.142082
Event: Microelectronic Processing '92, 1992, San Jose, CA, United States

Abstract

This paper offers the results of investigations of forming the submicron topological structures of the 'contact window'-type by using only all-dry vacuum and plasmas technologies. A technological process of manufacturing a three-layer structure 'metal-dielectric-metal' by using the LVPL is developed to study electrical characteristic of systems with micron and submicron contact windows. The contact resistance versus contact window dimensions obtained with the aid of such structures is the inverse square dependence which correlates well with the calculated one. Analysis is made of the relationship between lithographic and electric parameters of contact systems with micron-size features.

Citation Download Citation

Anatoly I. Sharendo, Victor V. Boksha, Eduard I. Tochitsky, and Vyjacheslav E. Obukhov "Forming of "contact window" submicron topological structure by laser vacuum lithography", Proc. SPIE 1804, Rapid Thermal and Laser Processing, (16 March 1993); https://doi.org/10.1117/12.142082

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