Electrooptic Deflector Design Considerations For Use In The Crystal Streak Camera

S. W. Thomas

doi:10.1117/12.957627

27 July 1979 Electrooptic Deflector Design Considerations For Use In The Crystal Streak Camera

S. W. Thomas

Proceedings Volume 0189, 13th Intl Congress on High Speed Photography and Photonics; (1979) https://doi.org/10.1117/12.957627
Event: 13th International Congress on High Speed Photography and Photonics, 1978, Tokyo, Japan

Abstract

Figure-of-merit equations for material selection and detailed design equations have been developed to aid in the design of a linear electrooptic deflector element for use in a 10-ps streak camera. The figure of merit indicates that BaTiO₃, KTN, and ammonium oxalate (AMO) are suitable materials. Possible deflector designs, including that of a current AMO prototype development program, are discussed. Quadratic (Kerr-effect) operation and materials are discussed along with the possibility for 10.6-μm-wavelength use.

Citation Download Citation

S. W. Thomas "Electrooptic Deflector Design Considerations For Use In The Crystal Streak Camera", Proc. SPIE 0189, 13th Intl Congress on High Speed Photography and Photonics, (27 July 1979); https://doi.org/10.1117/12.957627

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