FIB repair of 5x reticles and effects on IC quality

Philip D. Prewett; Brian Martin; A. W. Eastwood; John G. Watson

doi:10.1117/12.148984

4 August 1993 FIB repair of 5x reticles and effects on IC quality

Philip D. Prewett, Brian Martin, A. W. Eastwood, John G. Watson

Proceedings Volume 1926, Integrated Circuit Metrology, Inspection, and Process Control VII; (1993) https://doi.org/10.1117/12.148984
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

Focused ion beam repair of opaque defects on 5X reticles cause a post repair stain due mainly to gallium ion implantation in the surface of the quartz substrate. The effects of these stains have been investigated through printability tests using a g-line optical lithography process. In some cases the effect of the post repair stain is worse than that of the original defect, highlighting the need for effective antistain processes for use in conjunction with FIB repair.

Citation Download Citation

Philip D. Prewett, Brian Martin, A. W. Eastwood, and John G. Watson "FIB repair of 5x reticles and effects on IC quality", Proc. SPIE 1926, Integrated Circuit Metrology, Inspection, and Process Control VII, (4 August 1993); https://doi.org/10.1117/12.148984

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