High-resolution spectral studies and the absolute-wavelength calibration of a KrF excimer laser for microlithography

Igor V. Fomenkov; Richard L. Sandstrom

doi:10.1117/12.150469

8 August 1993 High-resolution spectral studies and the absolute-wavelength calibration of a KrF excimer laser for microlithography

Igor V. Fomenkov, Richard L. Sandstrom

Author Affiliations +

Proceedings Volume 1927, Optical/Laser Microlithography; (1993) https://doi.org/10.1117/12.150469
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

We present measurements of the spectral characteristics of a spectrally narrowed KrF excimer laser designed for use in advanced, high numerical aperture deep UV steppers. Using a specially designed high resolution grating spectrometer, we measured a bandwidth of 1.06 pm FWHM, with 95% of the energy contained within a 3.15 pm band (6 W output power). Using an atomic iron emission line ((lambda) equals 248.3271 nm), the grating spectrometer, and the laser's etalon based wavemeter, the absolute wavelength was calibrated to an accuracy better than 0.1 pm.

Citation Download Citation

Igor V. Fomenkov and Richard L. Sandstrom "High-resolution spectral studies and the absolute-wavelength calibration of a KrF excimer laser for microlithography", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150469

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