Paper
1 February 1994 Production and characterization of ion-beam-sputtered multilayers
Joseph Pedulla, Richard D. Deslattes Jr.
Author Affiliations +
Abstract
We report on the application of low pressure ion beam sputtering combined with simultaneous (neutralized) ion beam polishing to the production of multilayer structures for x-ray optics. Initial examination of these structures by high resolution diffractometry at 0.154 nm indicates that the structures exhibit a high degree of structural perfection.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joseph Pedulla and Richard D. Deslattes Jr. "Production and characterization of ion-beam-sputtered multilayers", Proc. SPIE 2011, Multilayer and Grazing Incidence X-Ray/EUV Optics II, (1 February 1994); https://doi.org/10.1117/12.167240
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CITATIONS
Cited by 3 scholarly publications.
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KEYWORDS
Ion beams

Sputter deposition

Multilayers

Ions

Silicon

Crystals

Silicon films

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