Universal pattern data format

Michael R. Rolle

doi:10.1117/12.167270

15 February 1994 Universal pattern data format

Michael R. Rolle

Proceedings Volume 2087, 13th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.167270
Event: 13th Annual BACUS Symposium on Photomask Technology and Management, 1993, Santa Clara, CA, United States

Abstract

This paper will discuss a new universal format for representing the pattern data and other information which define integrated circuits and the process of making them. The format, and the applications to be built around it, are designed to greatly save in cost, reduce production time, eliminate errors, and simplify procedures. It is called a `universal' format because the pattern data for a mask or a wafer can be encoded independently of the method of manufacturing it, and all tools can access the same data file without data conversion. The format encompasses all aspects of production, including mask layout, critical dimensions, e- beam and optical stepper proximity corrections, phase shift masks, and overlap removal. This paper discusses technology for connecting the universal format data in real time to high-speed tools for lithography (both raster and shaped beam technologies) and inspection.

Citation Download Citation

Michael R. Rolle "Universal pattern data format", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); https://doi.org/10.1117/12.167270

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