Near-field nanofabrication with pipette-guided ArF excimer laser

Michael Rudman; Anatoly Shchemelinin; Klony S. Lieberman; Aaron Lewis

doi:10.1117/12.175473

17 May 1994 Near-field nanofabrication with pipette-guided ArF excimer laser

Michael Rudman, Anatoly Shchemelinin, Klony S. Lieberman, Aaron Lewis

Proceedings Volume 2197, Optical/Laser Microlithography VII; (1994) https://doi.org/10.1117/12.175473
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

A number of distance control methods have been developed that allow the direct ablation capabilities of the ArF excimer laser to be applied to near-field optical methods of nanopatterning. Feedback systems based on evanescent field detection, capacitance, and lateral atomic force sensing have been incorporated into our near-field optical nanofabrication system. Using these control techniques, structures were directly patterned on a variety of substrates with dimension on the order of 100 nm. These feedback techniques are versatile enough to allow accurate distance control despite severe disturbances to the system caused by high energy excimer laser pulses.

Citation Download Citation

Michael Rudman, Anatoly Shchemelinin, Klony S. Lieberman, and Aaron Lewis "Near-field nanofabrication with pipette-guided ArF excimer laser", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); https://doi.org/10.1117/12.175473

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