At-wavelength testing of optics for EUV

Kenneth A. Goldberg; H. Raul Beguiristain; Jeffrey Bokor; Hector Medecki; Keith H. Jackson; David T. Attwood Jr.; Gary E. Sommargren; James P. Spallas; Ralph E. Hostetler

doi:10.1117/12.209172

19 May 1995 At-wavelength testing of optics for EUV

Kenneth A. Goldberg, H. Raul Beguiristain, Jeffrey Bokor, Hector Medecki, Keith H. Jackson, David T. Attwood Jr., Gary E. Sommargren, James P. Spallas, Ralph E. Hostetler

Author Affiliations +

Proceedings Volume 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V; (1995) https://doi.org/10.1117/12.209172
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

Optical systems for extreme ultraviolet (EUV) lithography require optical elements with wavefront aberrations limited to a fraction of an EUV wavelength to achieve diffraction-limited performance. Achieving wavefront and surface figure metrology at this level of accuracy is one of the key challenges in the development of EUV lithography. We have successfully built and operated a prototype EUV point diffraction interferometer which is capable of performing wavefront measurement of EUV optical elements at their operational wavelength. Initial experiments to characterize the interferometer, and to measure the optical wavefront diffracted from a Fresnel zone plate lens are discussed.

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Kenneth A. Goldberg, H. Raul Beguiristain, Jeffrey Bokor, Hector Medecki, Keith H. Jackson, David T. Attwood Jr., Gary E. Sommargren, James P. Spallas, and Ralph E. Hostetler "At-wavelength testing of optics for EUV", Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); https://doi.org/10.1117/12.209172

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