Conductivity and reproducibility of e-beam-induced deposited tungsten lines

Klaus T. Kohlmann-von Platen; L. Schmidt; Wilhelm H. Bruenger

doi:10.1117/12.209159

19 May 1995 Conductivity and reproducibility of e-beam-induced deposited tungsten lines

Klaus T. Kohlmann-von Platen, L. Schmidt, Wilhelm H. Bruenger

Proceedings Volume 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V; (1995) https://doi.org/10.1117/12.209159
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

The e-beam induced deposition process with the precusor gas W(CO)₆ is investigated with the aim of improving the conductivity of the deposits. For this purpose, lines are deposited on KELVIN structures of gold on siliconoxide. A non-ohmic behavior is observed, if the connection of the deposits to the gold is incomplete. The reproducibility of the process mainly depends on the stability of the current density. Keeping the current density constant, the deviations of the conductivity are less than 20%. By increasing the dwell time and by lowering the beam energy and the beam step size (BSS), the specific resistance decreases down to 10^-3 (Omega) cm. We conjecture that at a beam energy of 1 keV and a current density of 60-70 A/cm² the conductivity and the reproducibility might further be improved.

Citation Download Citation

Klaus T. Kohlmann-von Platen, L. Schmidt, and Wilhelm H. Bruenger "Conductivity and reproducibility of e-beam-induced deposited tungsten lines", Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); https://doi.org/10.1117/12.209159

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