Effect of reducing the contaminant concentration when patterning a chemically amplified positive resist

Akira Oikawa; Yasunori Hatakenaka; Yumiko Ikeda; Yoko Kokubo; Motoko Tanishima; Nobuaki Santoh; Naomichi Abe

doi:10.1117/12.210383

9 June 1995 Effect of reducing the contaminant concentration when patterning a chemically amplified positive resist

Akira Oikawa, Yasunori Hatakenaka, Yumiko Ikeda, Yoko Kokubo, Motoko Tanishima, Nobuaki Santoh, Naomichi Abe

Proceedings Volume 2438, Advances in Resist Technology and Processing XII; (1995) https://doi.org/10.1117/12.210383
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

We considered that contaminant control could best be addressed from the processing side. A KrF excimer stepper and a track system were physically integrated and equipped with chemical filter units. The atmosphere where wafers were transported from exposure to postexposure bake (PEB) was enclosed. The measured ammonia concentration was always less than 0.5 (mu) g/m³ everywhere within the enclosed atmosphere. We patterned resists with an ammonia concentration of 0.2 (mu) g/m³. They showed no T-tops and the deviation rates of line width against PEB were within the range of 0.56 to 0.80 nm/min for line and space patterns between 0.30 to 0.35 micrometers . These low deviation rates were considered to be acceptable for manufacturing purposes.

Citation Download Citation

Akira Oikawa, Yasunori Hatakenaka, Yumiko Ikeda, Yoko Kokubo, Motoko Tanishima, Nobuaki Santoh, and Naomichi Abe "Effect of reducing the contaminant concentration when patterning a chemically amplified positive resist", Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); https://doi.org/10.1117/12.210383

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available