New CD-SEM technology for 0.25 um production

Steven R. Rogers

doi:10.1117/12.209220

22 May 1995 New CD-SEM technology for 0.25-μm production

Steven R. Rogers

Proceedings Volume 2439, Integrated Circuit Metrology, Inspection, and Process Control IX; (1995) https://doi.org/10.1117/12.209220
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

To meet the requirements of 0.25 micrometers integrated circuit CD-Metrology, new detection and SEM optics have been developed which provide: (a) 5 nm resolution at 0.6 keV and (b) Spatial metrology using a split in-lens secondary electron detector. The superb resolution at low beam energies is achieved using a ChromaCorrected objective lens having overlapping magnetic and electrostatic fields. The lens was numerically optimized to achieve exceedingly small chromatic aberration coefficients at the low beam energies. The detector is inside the electron column and above the objective lens. This permits the use of a very short working distance, which enhances both resolution and detection efficiency. The concentric design permits collection of the secondary electrons with zero aberration of the primary beam. The detector plane is split into four quadrants, so as to enable the use of spatial metrology algorithms for topographic measurement.

Citation Download Citation

Steven R. Rogers "New CD-SEM technology for 0.25-μm production", Proc. SPIE 2439, Integrated Circuit Metrology, Inspection, and Process Control IX, (22 May 1995); https://doi.org/10.1117/12.209220

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