Novel x-ray mask inspection tool based on transmission x-ray conversion microscope

Ted Liang; Franco Cerrina; Thomas B. Lucatorto

doi:10.1117/12.240473

27 May 1996 Novel x-ray mask inspection tool based on transmission x-ray conversion microscope

Ted Liang, Franco Cerrina, Thomas B. Lucatorto

Proceedings Volume 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI; (1996) https://doi.org/10.1117/12.240473
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

We present the design and preliminary experimental results on a novel x-ray mask inspection tool based on a transmission x-ray secondary electron conversion microscope (TXsecM). The x-ray beam transmitted through the mask impinges onto a high quantum yield photoemissive cathode located at the plane where the wafer will be placed in the stepper. The cathode converts photons into low energy secondary electrons with narrow bandwidth, and the electrons are then imaged by a specially designed low voltage electrostatic lens column with 1200X magnification. Therefore, the micrographs thus obtained represent an accurate map of the x-ray radiation on the resist in an actual production exposure. TXsecM is an ideal tool for x-ray mask inspection as well as image formation analysis in real time. The design goal is to achieve 20nm spatial resolution.

Citation Download Citation

Ted Liang, Franco Cerrina, and Thomas B. Lucatorto "Novel x-ray mask inspection tool based on transmission x-ray conversion microscope", Proc. SPIE 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI, (27 May 1996); https://doi.org/10.1117/12.240473

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