Multiple aperture imaging system for lithography

R. Völkel

doi:10.1117/12.2298886

1 September 1996 Multiple aperture imaging system for lithography

R. Völkel

Author Affiliations +

Proceedings Volume 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology; 277804 (1996) https://doi.org/10.1117/12.2298886
Event: 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 1996, Taejon, Korea, Republic of

Abstract

An optical system will be presented which uses a stack of microlens arrays for the 1:1 imaging of extended object planes. The system is based on the well-known concept of multiple aperture imaging. A compact imaging system was discovered which is remarkable in that it provides a diffraction limited resolution of 3 μm free of distortion and magnification errors for large object and image areas. 5 μm resolution was demonstrated by using melting resist microlens arrays.

Citation Download Citation

R. Völkel "Multiple aperture imaging system for lithography", Proc. SPIE 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 277804 (1 September 1996); https://doi.org/10.1117/12.2298886

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