Paper
1 November 1996 Application of metallic subwavelength gratings for polarization devices
Ernst-Bernhard Kley, Bernd Schnabel, Heike Huebner, Uwe D. Zeitner
Author Affiliations +
Abstract
E-beam lithography offers the possibility for fabricating metallic subwavelength gratings for visible light which show strong polarization properties. By using such gratings and other micro-optical elements (like lenses and diffraction gratings) a new kind of polarization detector without mechanical motion is proposed. The basic idea is the use of a special analyzing grating element with different grating directions (e.g. a circular metallic subwavelength grating). We realized both a wavelength-independent polarimeter and a polarimeter with spectroscopic properties. Characteristic parameters estimated are the angular resolution of the polarization plane (best value 0.001 degree) and the wavelength resolution (best value 15 nm).
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ernst-Bernhard Kley, Bernd Schnabel, Heike Huebner, and Uwe D. Zeitner "Application of metallic subwavelength gratings for polarization devices", Proc. SPIE 2863, Current Developments in Optical Design and Engineering VI, (1 November 1996); https://doi.org/10.1117/12.256221
Lens.org Logo
CITATIONS
Cited by 5 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Polarization

Polarimetry

Diffraction gratings

CCD cameras

Spatial resolution

Chemical elements

Lenses

Back to Top