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Polarization modulated spectroellipsometer was utilized to monitor, in-situ, deposition of Ag on Si substrate. The angle of incidence was determined using a Si substrate covered with native oxide. In the wavelength region of 550 nm to 700 nm, the ambiguity of the angle of incidence was within 0.2 deg. A plasma resonance peak manifested in reflectance spectrum around 350 nm increased and shifted to shorter wavelength as the deposition time increased from 1 sec to 10 sec. (Delta) (Psi) trajectory approached to a simulation curve of a continuous film as the deposition time increased to 40 sec where the film thickness was estimated to be 20 nm.
Tomoyuki Fukazawa,Kazuki Ishihara,Yoichi Hoshi, andShuichi Kawabata
"In-situ ultrahigh vacuum spectroscopic ellipsometry", Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); https://doi.org/10.1117/12.246213
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Tomoyuki Fukazawa, Kazuki Ishihara, Yoichi Hoshi, Shuichi Kawabata, "In-situ ultrahigh vacuum spectroscopic ellipsometry," Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); https://doi.org/10.1117/12.246213