Paper
25 April 1997 Fabrication of Si/Si1-xGex waveguide WDM components
Dan-Xia Xu, Siegfried Janz, Robin L. Williams, Elizabeth Allegretto, Sylvain Mailhot, Jian Jun He, Jean-Marc Baribeau, Hugues Lafontaine, John Stapledon, Jeffrey W. Fraser, Mike R. Robillard, Paul E. Jessop, Stephen Kovacic
Author Affiliations +
Abstract
The design of manufacturable Si/Si1-xGex waveguide WDM components involves several unique materials and fabrication issues which must be confronted and resolved. Accurate data for the refractive indices of the waveguide materials are essential. Furthermore, the waveguide design is tightly constrained by the requirement that Si/Si1-xGex layer thickness is within the pseudomorphic growth limit. By combining refractive indices determined from mode profile measurements of MBE and CVD grown waveguides, and epilayer thickness constraints set by the pseudomorphic growth limits, we have determined a set of design criteria for Si/Si1-xGex waveguides for WDM and optical signal routing applications. Optically smooth and vertical Si/Si1-xGex waveguide facets are critical in permitting highly efficient coupling between the fiber and the Si chip. Since Si has an equal probability of cleaving alone either the <110> or <111> planes, producing such high quality facets consistently is extremely challenging. We have demonstrated that high quality facets can be obtained consistently by cleaving, with and without a dielectric layer on Si substrates.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dan-Xia Xu, Siegfried Janz, Robin L. Williams, Elizabeth Allegretto, Sylvain Mailhot, Jian Jun He, Jean-Marc Baribeau, Hugues Lafontaine, John Stapledon, Jeffrey W. Fraser, Mike R. Robillard, Paul E. Jessop, and Stephen Kovacic "Fabrication of Si/Si1-xGex waveguide WDM components", Proc. SPIE 3007, Silicon-Based Monolithic and Hybrid Optoelectronic Devices, (25 April 1997); https://doi.org/10.1117/12.273852
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Cited by 4 scholarly publications.
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KEYWORDS
Waveguides

Silicon

Germanium

Refractive index

Wavelength division multiplexing

Waveguide modes

Chemical vapor deposition

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