New fabrication method for diffractive optical elements with deep phase relief

Victor Pavlovich Korolkov; Voldemar Petrovich Koronkevich; Anatoly I. Malyshev; Vladislav G. Nikitin

doi:10.1117/12.274416

15 May 1997 New fabrication method for diffractive optical elements with deep phase relief

Victor Pavlovich Korolkov, Voldemar Petrovich Koronkevich, Anatoly I. Malyshev, Vladislav G. Nikitin

Proceedings Volume 3010, Diffractive and Holographic Device Technologies and Applications IV; (1997) https://doi.org/10.1117/12.274416
Event: Photonics West '97, 1997, San Jose, CA, United States

Abstract

The application of continuous-tone photomasks for fabrication of diffractive optical elements with a deep phase relief is explored. Results of computer simulation for technological process are reported and compared with experiment. The experimental testing of offered technique was carried out on thick AZ4562 photoresist layers. The possibility of deep phase relief fabrication has been proven. The application of the new technique to fabrication of multiorder diffractive elements is discussed.

Citation Download Citation

Victor Pavlovich Korolkov, Voldemar Petrovich Koronkevich, Anatoly I. Malyshev, and Vladislav G. Nikitin "New fabrication method for diffractive optical elements with deep phase relief", Proc. SPIE 3010, Diffractive and Holographic Device Technologies and Applications IV, (15 May 1997); https://doi.org/10.1117/12.274416

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