Multipass gray printing for the new MEBES 4500S mask lithography system

Frank E. Abboud; Robert L. Dean; Janine J. Doering; W. Eckes; Mark A. Gesley; Ulrich Hofmann; Terry Mulera; Robert J. Naber; M. Pastor; Wayne Phillips; John Raphael; Frederick Raymond III; Charles A. Sauer

doi:10.1117/12.277295

28 July 1997 Multipass gray printing for the new MEBES 4500S mask lithography system

Frank E. Abboud, Robert L. Dean, Janine J. Doering, W. Eckes, Mark A. Gesley, Ulrich Hofmann, Terry Mulera, Robert J. Naber, M. Pastor, Wayne Phillips, John Raphael, Frederick Raymond III, Charles A. Sauer

Author Affiliations +

Proceedings Volume 3096, Photomask and X-Ray Mask Technology IV; (1997) https://doi.org/10.1117/12.277295
Event: Photomask Japan '97, 1997, Kawasaki City, Japan

Abstract

Etec Systems, Inc. has developed a new e-beam mask lithography system, the MEBES 4500S, featuring a higher productivity writing strategy called multipass gray and a number of mechanical and electrical improvements. This new system, based on the proven technologies introduced in the MEBES 4500 system, provides improved throughput and accuracy. The MEBES 4500S system with multipass gray supports smaller mask design addresses needed for high resolution masks, while providing higher dose for high contrast processes with low sensitivity and improved CD linearity. Improved print performance is achieved by the introduction of several system design changes that work in conjunction with the multipass gray writing mode. These changes include improved column deflection system temperature control, enhanced TFE current control, improved work chamber thermal management, and improved stage drive vibration damping. Details of these features are presented along with first performance data for the new system.

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Frank E. Abboud, Robert L. Dean, Janine J. Doering, W. Eckes, Mark A. Gesley, Ulrich Hofmann, Terry Mulera, Robert J. Naber, M. Pastor, Wayne Phillips, John Raphael, Frederick Raymond III, and Charles A. Sauer "Multipass gray printing for the new MEBES 4500S mask lithography system", Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); https://doi.org/10.1117/12.277295

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